Methods for forming wiring and electrode

ABSTRACT

There is provided a method for forming wiring or an electrode by coating a substrate with a composition comprising (A) a complex of an amine compound and a hydrogenated aluminum compound and (B) a titanium compound or a composition comprising the complex and (C) metal particles and subjecting the obtained coating film to heating and/or a light treatment. By the method, a film can be formed that uses a conductive film forming composition with which wiring and an electrode that can be suitably used for electronic devices can be formed easily and inexpensively.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a composition for forming a conductivefilm and a method for forming wiring or an electrode on a substrate byuse thereof. More specifically, it relates to a conductive film formingmethod which can be suitably used in formation of wiring or an electrodefor an electronic device.

2. Description of the Related Art

Aluminum is used as a wiring material used in a number of electronicdevices such as a solar cell, a semiconductor device and an electronicdisplay device. Heretofore, it has been generally practiced that such analuminum film is formed by a vacuum process such as sputtering, vacuumdeposition or CVD and the obtained aluminum film is then processed intoan aluminum pattern by photo-etching using a resist. However, thismethod is disadvantageous from the viewpoint of energy consumption sinceit requires a large-scale vacuum deposition apparatus. Further, since itis difficult to form aluminum wiring uniformly on a large-area substrateby this method, a yield is poor, causing an increase in costs.

Meanwhile, in recent years, a paste which has fine aluminum particlesdispersed in a binder has been developed, and a method of forming apattern of aluminum by pattern-printing the paste by, e.g., screenprinting, and baking the printed paste has been reported (JP-A10-335267) (the term “JP-A” as used herein means an “unexaminedpublished Japanese patent application”). This method can be carried outat a low cost because it deals with direct patterning by printing of thealuminum paste. However, obtained aluminum is liable to containimpurities, an aluminum pattern with a low resistance is difficult toobtain, and formation of a fine pattern by the method is difficult froma technical standpoint.

Further, a method has been developed that comprises coating a solutionof a specific organic aluminum compound by, e.g., spin coating so as toform a coating film and baking the film so as to form a conductive film.In this method, organic components of the organic aluminum used and asolvent used scatter, thereby making the obtained film inevitably liableto have a lower density than a film formed by a vacuum method such assputtering. Accordingly, when a high-density film is required as in thecase where the obtained film is used as a conductive film, the lowdensity of the film obtained by the above method may be a problem.

SUMMARY OF THE INVENTION

The present invention has been conceived under the above circumstances.Thus, an object of the present invention is to provide a composition forforming a conductive film which can form wiring or an electrode whichcan be suitably used in a number of electronic devices easily andinexpensively, and a film forming method using the composition.

Another object of the present invention is to provide wiring and anelectrode which are formed by the method of the present invention.

Other objects and advantages of the present invention will becomeapparent from the following description.

According to the present invention, firstly, the above objects andadvantages of the present invention are achieved by a composition forforming a conductive film comprising a complex of an amine compound andhydrogenated aluminum compound, and a titanium compound.

According to the present invention, secondly, the above objects andadvantages of the present invention are achieved by a method for forminga conductive film (hereinafter may be referred to as a first method ofthe present invention) which comprises coating a substrate with acomposition comprising (A) a complex of an amine compound and ahydrogenated aluminum compound, and (B) a titanium compound and thensubjecting the obtained coating film to heating and/or a light treatmentto form a conductive film.

According to the present invention, thirdly, the above objects andadvantages of the present invention are achieved by a method for forminga conductive film (hereinafter may be referred to as a second method ofthe present invention) which comprises coating a substrate with acomposition comprising (A) a complex of an amine compound and ahydrogenated aluminum compound, and (C) metal particles and thensubjecting the obtained coating film to heating and/or a light treatmentto form a conductive film.

According to the present invention, fourthly, the above objects andadvantages of the present invention are achieved by wiring and anelectrode of a conductive film which are formed by the above methods ofthe present invention.

Hereinafter, the present invention will be further described.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Firstly, the film forming composition used in the first method of thepresent invention will be described.

Hydrogenated aluminum (often briefly referred to as “alan”) used in thepresent invention is a compound comprising aluminum and a hydrogen atom,and it is believed that the compound generally has a formula representedby AlH₃.

The complex of an amine compound and alan which is used in the filmforming composition in the present invention can be synthesized inaccordance with methods described in J. K. Ruff et al., J. Amer. Chem.Soc., vol. 82, p. 2141, 1960; G. W. Fraser et al., J. Chem. Soc., p.3742, 1963; and J. L. Atwood et al., J. Amer. Chem. Soc., vol. 113, p.8133, 1991.

For example, the complex of an amine compound and alan which is used inthe film forming composition in the present invention can be synthesizedby adding a hydrochloride of an amine compound to a diethyl ethersolution of aluminum lithium hydride and causing them to react underagitation at room temperature in an N₂ gas, for example. Aftercompletion of the reaction, by-produced lithium chloride and unreactedaluminum lithium hydride are removed from the reaction solution by afilter or the like, a desired coating solution is added to the resultingsolution, and then a solvent used in the reaction, e.g., diethyl ether,is removed under a reduced pressure so as to give the target product.The reaction temperature, the reaction solvent, etc. are selectedaccording to the type of the desired complex of an amine compound andalan.

The amine compound used in the present invention may be a polyaminecompound such as a monoamine compound, a diamine compound, a triaminecompound or a tetraamine compound.

The monoamine compound is represented by, for example, the followingformula (1):R¹R²R³N  (1)wherein R¹, R² and R³ are each independently a hydrogen atom, an alkylgroup, an alkenyl group, an alkynyl group, a cycloalkyl group or an arylgroup.Suitable specific examples of R¹, R² and R³ in the formula (1) includehydrogen, an alkyl group having 1 to 12 carbon atoms such as methyl,ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl,undecyl and dodecyl groups, an alkenyl group having an unsaturated groupsuch as a metaallyl group, an alkynyl group such as a phenylethynylgroup, an alicyclic alkyl group such as a cyclopropyl group, and an arylgroup such as phenyl and benzyl groups. These alkyl, alkenyl and alkynylgroups may be linear, cyclic or branched.

Specific examples of the compound represented by the formula (1) includeammonia, trimethylamine, triethylamine, tri-n-propylamine,tri-isopropylamine, tricyclopropylamine, tri-n-butylamine,triisobutylamine, tri-t-butylamine, tri-2-methylbutylamine,tri-n-hexylamine, tricyclohexylamine, tri(2-ethylhexyl)amine,trioctylamine, triphenylamine, tribenzylamine, dimethylphenylamine,diethylphenylamine, diisobutylphenylamine, methyldiphenylamine,ethyldiphenylamine, isobutyldiphenylamine, dimethylamine, diethylamine,di-n-propylamine, diisopropylamine, dicyclopropylamine, di-n-butylamine,diisobutylamine, di-t-butylamine, methylethylamine, methylbutylamine,di-n-hexylamine, dicyclohexylamine, di(2-ethylhexyl)amine, dioctylamine,diphenylamine, dibenzylamine, methylphenylamine, ethylphenylamine,isobutylphenylamine, methylmethacrylamine, methyl(phenylethynyl)amine,phenyl(phenylethynyl)amine, methylamine, ethylamine, n-propylamine,isopropylamine, cyclopropylamine, n-butylamine, isobutylamine,t-butylamine, 2-methylbutylamine, n-hexylamine, cyclohexylamine,2-ethylhexylamine, octylamine, phenylamine and benzylamine.

Illustrative examples of the polyamine compound include ethylenediamine,N,N′-dimethylethylenediamine, N,N′-diethylethylenediamine,N,N′-diisopropylethylenediamine, N,N′-di-t-butylethylenediamine,N,N′-diphenylethylenediamine, N,N,N′,N′-tetramethylethylenediamine,N,N,N′,N′-tetraethylethylenediamine, diethylenetriamine,1,7-dimethyl-1,4,7-triazaheptane, 1,7-diethyl-1,4,7-triazaheptane,triethylenetetraamine, phenylenediamine,N,N,N′,N′-tetramethyldiaminobenzene, 1-aza-bicyclo[2.2.1]heptane,1-aza-bicyclo[2.2.2]octane (quinuclidine), 1-azacyclohexane,1-aza-cyclohexane-3-ene, N-methyl-1-azacyclohexane-3-ene, morpholine,N-methyl morpholine, N-ethyl morpholine, piperazine, andN,N′,N″-trimethyl-1,3,5-triazacyclohexane. These amine compounds can beused alone or in admixture of two or more.

Illustrative examples of the titanium-containing compound which is usedin the present invention include a compound represented by the followingformula (2):Ti(OR⁴)_(x)(CH₃COCHCOOR⁵)_(4-x)  (2)

-   wherein R⁴ and R⁵ are the same or different and are an alkyl group    or a phenyl group, and x is 0 or an integer of 1 to 4,-   a compound represented by the following formula (3):    Ti(OR⁶)_(y)(X)_(4-y)  (3)-   wherein R⁶ is an alkyl group or a phenyl group, X is a halogen atom,    and y is an integer of 1 to 3, a compound represented by the    following formula (4):    Ti(OR⁷)_(z)(NHR⁸)_(4-z)  (4)-   wherein R⁷ and R⁸ are the same or different and are an alkyl group    or a phenyl group, and z is 0 or an integer of 1 to 3, and a    compound represented by the following formula (5):    Ti(Cp)_(n)(Y)_(4-n)  (5)    wherein Cp is cyclopentadienyl group, Y is a halogen atom or an    alkyl group, and n is an integer of 1 to 4.

Specific examples of the titanium-containing compound include titaniumalkoxides such as titanium methoxide, titanium ethoxide,titanium-n-propoxide, titanium-n-nonyl oxide, titanium stearyl oxide,titanium isopropoxide, titanium-n-butoxide, titanium isobutoxide,titanium-t-butoxide, titanium tetrakis(bis-2,2-(allyloxymethyl)butoxide,titanium triisostearoyl isopropoxide, titanium trimethylsiloxide,titanium-2-ethylhexoxide, titanium methacrylate triisopropoxide,(2-methacryloxyethoxy)triisopropoxy titanate, titanium methoxypropoxide,titanium phenoxide, titanium methylphenoxide, poly(dibutyltitanate),poly(octylene glycol titanate), titanium bis(triethanolamine)diisopropoxide, titaniumtris(dodecylbenzenesulfonate)isopropoxide, titanium trimethacrylatemethoxyethoxyethoxide, titanium tris(dioctylpyrophosphate)isopropoxideand titanium lactate; amino-group-containing titanium compounds such astetrakis(dimethylamino)titanium and tetrakis(diethylamino)titanium;titanium complexes with β-diketones such as titaniumbis(ethylacetoacetate)diisopropoxide,tris(2,2,6,6-tetramethyl-3,5-heptanedionate)titanium, titanium oxidebis(pentanedionate), titanium oxide(tetramethylheptanedionate), titaniummethacryloxyacetoacetate triisopropoxide, titaniumdi-n-butoxide(bis-2,4-pentanedionate), titaniumdiisopropoxide(bis-2,4-pentanedionate), titanium diisopropoxidebis(tetramethylheptanedionate), titanium diisopropoxidebis(ethylacetoacetate), titanium tetraethylacetoacetate, titaniumtetramethylacetoacetate,di(iso-propoxide)bis(2,2,6,6-tetramethyl-3,5-heptane dionate)titaniumand titanium allylacetoacetate triisopropoxide; titanium compoundscontaining a cyclopentadienyl group such as dicyclopentadienyl titaniumdichloride, dicyclopentadienyl titanium dibromide, cyclopentadienyltitanium trichloride, cyclopentadienyl titanium tribromide,dicyclopentadienyl dimethyl titanium, dicyclopentadienyl diethyltitanium, dicyclopentadienyl di-t-butyl titanium, dicyclopentadienylphenyl titanium chloride, dicyclopentadienyl methyl titanium chloride,(trimethyl)pentamethylcyclopentadienyl titanium and dimethylbis(t-butylcyclopentadienyl)titanium; and titanium compounds having ahalogen atom such as indenyl titanium trichloride,pentamethylcyclopentadienyl titanium trichloride,pentamethylcyclopentadienyl titanium trimethoxide,trichlorotris(tetrahydrofuran)titanate, tetrachlorobis (tetrahydrofuran)titanium, titanium chloride triisopropoxide, titanium iodidetriisopropoxide, titanium dichloride diethoxide,dichlorobis(2,2,6,6-tetramethyl-3,5-heptanedionate) titanium,tetrachlorobis(cyclohexylmercapto)titanium and titanium chloride.

The film forming composition in the present invention which comprises(1) the complex of the amine compound and the hydrogenated aluminumcompound, (2) the titanium-containing compound, and in some cases, (3) asolvent is not limited to a particular production method. Thecomposition is prepared by adding a given amount of thetitanium-containing compound to a solution of the complex of the aminecompound and the hydrogenated aluminum compound under agitation. Thetemperature at which the titanium-containing compound is added ispreferably 0 to 150° C., more preferably 5 to 100° C. The agitation timeis preferably 0.1 to 120 minutes, more preferably 0.2 to 60 minutes.When the temperature of the addition is higher than 150° C. or theagitation time is longer than 120 minutes, a nonuniform solution may beprepared or a precipitate may be produced. Meanwhile, when thetemperature of the addition is lower than 0° C. or the agitation time isshorter than 0.1 minutes, a baked film (e.g., a conductive film) havinga high film density may not be obtained.

The solvent used in this reaction may be any solvent capable ofdissolving the complex of the amine compound and the hydrogenatedaluminum compound and the titanium-containing compound. As the solvent,the same solvents as those to be described later which can be used forthe film forming composition can be used.

The film forming composition used in the present invention may containan aluminum compound other than the complex of the amine compound andthe alan. Illustrative examples of aluminum compounds other than theabove complex which can be added include trimethyl aluminum, triethylaluminum, tri-n-propyl aluminum, tricyclopropyl aluminum, tri-n-butylaluminum, triisobutyl aluminum, tri-t-butyl aluminum, tri-2-methylbutylaluminum, tri-n-hexyl aluminum, tricyclohexyl aluminum,tri(2-ethylhexyl)aluminum, trioctyl aluminum, triphenyl aluminum,tribenzyl aluminum, dimethylphenyl aluminum, diethylphenyl aluminum,diisobutylphenyl aluminum, methyldiphenyl aluminum, ethyldiphenylaluminum, isobutyldiphenyl aluminum, diethyl aluminum hydride,diisobutyl aluminum hydride, diphenyl aluminum hydride, dimethylmethacryl aluminum, dimethyl(phenylethynyl)aluminum,diphenyl(phenylethynyl)aluminum, a dimethylamine-dimethyl aluminumcomplex, a diethylamine.diethyl aluminum complex, adimethylamine.diethyl aluminum complex, a diethylamine.dimethyl aluminumcomplex, a diphenylamine.dimethyl aluminum complex and adiphenylamine.diethyl aluminum complex. These aluminum compounds can beused alone or in combination of two or more.

As for the proportions of the complex (1) of the amine compound and thehydrogenated aluminum compound and the titanium-containing compound (2),the amount of the titanium-containing compound (2) is preferably 0.001to 30 mol %, more preferably 0.005 to 20 mol %, based on the total ofthe complex (1) and the compound (2). When the amount of thetitanium-containing compound (1) is smaller than 0.001 mol %, a filmwith a high density may not be obtained, while when it is larger than 30mol %, the stability of the solution may be difficult to attain.

The solution of the film forming composition in the present inventioncan be used in admixture of fines particles of metal such as gold,silver, copper, aluminum, nickel, iron, niobium, titanium, silicon,indium or tin or/and a semiconductor as appropriate, so as to haveconductivity. Further, the solution can also be used in admixture offine particles of a metal oxide such as aluminum oxide, zirconium oxide,titanium oxide or silicon oxide as required. Further, to improve thewettability of the solution against an object to be coated and theleveling property of a coating film and to prevent the occurrences ofspots and orange peel in the coating film, a surface tension regulatorsuch as a fluorine-based surfactant, a silicon-based surfactant or anonionic surfactant can be added in such a small amount that does notimpairthe desiredeffectas required. Illustrative examples of nonionicsurfactants which can be added include a fluorine-based surfactanthaving a fluorinated alkyl group or a perfluoroalkyl group and apolyether alkyl based surfactant having an oxyalkyl group. Illustrativeexamples of the above fluorine-based surfactant include C₉F₁₉CONHC₁₂H₂₅,C₈F₁₇SO₂NH—(C₂H₄O)₆H, C₉F₁₇O(PLURONIC L-35)C₉F₁₇ and C₉F₁₇O(PLURONICP-84)C₉F₁₇ (wherein PLURONIC L-35: product of Asahi Denka Co., Ltd.,polyoxypropylene-polyoxyethylene block copolymer, average molecularweight=1,900; PLURONIC P-84: product of Asahi Denka Co., Ltd.,polyoxypropylene-polyoxyethylene block copolymer, average molecularweight=4,200; TETRONIC-704: product of Asahi Denka Co., Ltd.,N,N,N′,N′-tetrakis(polyoxypropylene-polyoxyethylene block copolymer),average molecular weight=5,000). Specific examples of thesefluorine-based surfactants include EFTOP EF301, EF303 and EF352(products of SHIN AKITA KASEI CO., LTD.), MEGAFACE F171 and F173(products of DAINIPPON INK AND CHEMICALS, INCORPORATED), ASAHI GUARDAG710 (product of ASAHI GLASS CO., LTD.), FLORAD PC-170C, FC430 andFC431 (products of Sumitomo 3M), SURFLON S-382, SC101, SC102, SC103,SC104, SC105 and SC106 (products of ASAHI GLASS CO., LTD.), BM-1000 andBM-1100 (products of B.M-Chemie Co., Ltd.) and Schsego-Fluor (product ofSchwegmann CO., Ltd.). Further, illustrative examples of the polyetheralkyl based surfactant include a polyoxyethylene alkyl ether, apolyoxyethylene allyl ether, a polyoxyethylene alkyl phenol ether, apolyoxyethylene fatty acid ester, a sorbitan fatty acid ester, apolyoxyethylene sorbitan fatty acid ester and an oxyethyleneoxypropylene block polymer. Specific examples of these polyether alkylbased surfactants include EMULGEN 105, 430, 810 and 920, REODOLE SP-40Sand TW-L120, EMANOLE 3199 and 4110, EXEL P-40S, BRIDGE 30, 52, 72 and92, ARACEL 20, EMASOLE 320, TWIN 20 and 60 and MERGE 45 (products of KAOCORPORATION), and NONIBOL 55 (product of Sanyo Chemical Industries,Ltd.). Illustrative examples of nonionic surfactants other than thoseenumerated above include a polyoxyethylene fatty acid ester, apolyoxyethylene sorbitan fatty acid ester, and a polyalkylene oxideblock copolymer. Specific examples thereof include CHEMISTAT 2500(product of Sanyo Chemical Industries, Ltd.), SN-EX 9228 (product of SANNOPCO LTD.) and NONAL 530 (product of TOHO CHEMICAL INDUSTRY CO., LTD.).

Solvents which can be used in the film forming composition in thepresent invention are any solvents which dissolve the complex (1) of theamine compound and the hydrogenated aluminum compound and thetitanium-containing compound (2) and do not react with the complex (1)and the compound (2). Illustrative examples of such solvents includehydrocarbon-based solvents such as n-pentane, cyclopentane, n-hexane,cyclohexane, n-heptane, cycloheptane, n-octane, cyclooctane, decane,cyclodecane, dicyclopentadiene hydride, benzene, toluene, xylene,durene, indene, tetrahydronaphthalene, decahydronaphthalene andsqualane; ether-based solvents such as diethyl ether, dipropyl ether,dibutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethylether, ethylene glycol methylethyl ether, diethylene glycol dimethylether, diethylene glycol diethyl ether, diethylene glycol methylethylether, tetrahydrofuran, tetrahydropyran, bis(2-methoxyethyl)ether andp-dioxane; and polar solvents such as methylene chloride and chloroform.Of these, the hydrocarbon-based solvent or a mixture of thehydrocarbon-based solvent and the ether-based solvent is preferably usedfrom the viewpoints of solubility and the stability of the solution.These solvents may be used alone or in admixture of two or more.

The solid concentration of the film forming composition in the presentinvention is preferably 0.1 to 100 wt %, more preferably 10 to 80 wt %.It can be adjusted to a proper concentration according to the thicknessof a desired conductive film.

Next, a film forming composition used in the second method of thepresent invention will be described.

As a complex of an amine compound and hydrogenated aluminum, the samecomplex as that described with respect to the first method is used. Itshould be understood that what has been described about the complex inthe first method directly applies to the complex in the second method.

Illustrative examples of metal particles which are preferably used inthe present invention include Al, Cu, Ag, Au, Ni, Ru, Pd, Pt and Sn.These metal particles are used alone or in combination of two or more.As these metal particles, commercially available metal particles can beused either directly or after oxides on the surfaces are removed by acidor alkali. The acid or alkali for removing the oxides on the surfacesdepends on the type of metal to be surface-treated. Although the acid oralkali is not particularly limited, hydrochloric acid, sulfuric acid,nitric acid, hydrofluoric acid, etc., aqueous solutions of these acids,and aqueous solutions of alkalis such as sodium hydroxide and potassiumhydroxide can be used, for example.

The particle diameters of the metal particles are preferably not largerthan 10 μm, more preferably not larger than 5 μm, particularlypreferably not larger than 1 μm.

The film forming composition used in the present invention whichcomprises (1) the complex of an amine compound and a hydrogenatedaluminum compound, (2) the metal particles, and (3) a solvent asrequired, is not limited to a particular production method. It isprepared by adding a given amount of the metal particles to a solutionof the complex of an amine compound and a hydrogenated aluminum compoundunder agitation. The temperature at which the metal particles are addedis preferably 0 to 150° C., more preferably 5 to 100° C., and theagitation time is preferably 0.1 to 120 minutes, more preferably 0.2 to60 minutes.

The solvent used in this reaction may be any solvent capable ofdissolving the complex of an amine compound and a hydrogenated aluminumcompound. As the solvent, the same solvents as those to be describedlater which can be used for the film forming composition can be used.

The film forming composition used in the present invention may containan aluminum compound other than the complex of an amine compound andalan. Examples of aluminum compounds other the above complex which canbe added are the same aluminum compounds as those exemplified withrespect to the first method.

As for the proportions of the complex (1) of an amine compound and ahydrogenated aluminum compound and the metal particles (2), the amountof the metal particles (2) is preferably 0.01 to 100 parts by weight,more preferably 0.05 to 80 parts by weight, based on 100 parts by weightof the complex. When the amount of the metal particles is lower than0.01 parts by weight, a film with a high density may not be obtained,while when it is higher than 100 parts by weight, the stability of thesolution may be difficult to attain.

The solution of the film forming composition in the present inventioncan be used in admixture of fines particles of metal such as iron,niobium, titanium, silicon or indium or/and a semiconductor asappropriate, so as to have conductivity. Further, the solution can alsobe used in admixture of fine particles of a metal oxide such aszirconium oxide, titanium oxide or silicon oxide as required.

Further, to improve the wettability of the solution against an object tobe coated and the leveling property of a coating film and to prevent theoccurrences of spots and orange peel in the coating film, a surfacetension regulator such as a fluorine-based surfactant, a silicon-basedsurfactant or a nonionic surfactant can be added in such a small amountthat does not impair the desired effect as required. Specific examplesof the surfactants are the same as those enumerated with respect to thefirst method.

Solvents which can be used in the film forming composition are anysolvents which dissolve the complex (1) of an amine compound and ahydrogenated aluminum compound and do not react with the complex (1).For example, the same solvents as those exemplified with respect to thefirst method can be used.

The solid concentration of the film forming composition is preferably0.1 to 100 wt %, more preferably 10 to 80 wt %. It can be adjusted to aproper concentration according to the thickness of a desired conductivefilm.

Next, the first and second methods will be described.

The film forming solution composition obtained in the first or secondmethod is coated on a substrate. The material and shape of the substrateto be used are not particularly limited. Its material is preferablycapable of tolerating a heat treatment in a subsequent step. Further,the substrate on which a coating film is formed may have an even surfaceor an uneven surface, and its shape is not particularly limited.Specific examples of such a material for the substrate include glass,metal, plastic and ceramic. As glass, quartz glass, borosilicate glass,soda glass and lead glass can be used, for example. As metal, gold,silver, copper, nickel, silicon, aluminum, iron and stainless steel canbe used, for example. As plastic, a polyimide and a polyether sulfonecan be used, for example. Further, these materials are not limited toparticular shapes and may be in the shape of a bulk, a plate or a film.Further, a method of coating the solution is not particularly limitedand may be spin coating, dip coating, curtain coating, roll coating,spray coating, ink-jet printing or off-set printing. The solution may becoated once or multiple times. A suitable thickness of the coating filmvaries depending on the coating method and the solid concentration. Thefilm thickness is preferably 0.001 to 100 μm, more preferably 0.005 to50 μm.

Further, in the present invention, the above substrate can be preparedas a substrate which has a coating film (base layer) formed by coatingthe substrate with a solution which contains an organometallic compoundcontaining a metal atom selected from the group consisting of Ti, Pd andAl. Due to the presence of such a base layer, adhesion between thesubstrate and the aluminum film is retained in a stable condition.

Illustrative examples of an organometallic compound containing a Ti atominclude a titanium alkoxide, a titanium compound containing an aminogroup, a titanium compound with β-diketone, a titanium compoundcontaining a cyclopentadienyl group, and a titanium compound containinga halogen group.

Illustrative examples of an organometallic compound containing a Pd atominclude a palladium complex containing a halogen group, acetates, apalladium complex with β-diketone, a palladium complex with a compoundcontaining a conjugated carbonyl group, and a phosphine-based palladiumcomplex.

Further, illustrative examples of an organometallic compound containingan Al atom include an aluminum alkoxide, an aluminum alkylate, and analuminum complex with β-diketone, excluding an alan-amine complex.

Illustrative examples of the organometallic compounds include the sametitanium-containing compounds as the titanium-containing compounds usedin the conductive film forming composition in the first method,palladium complexes having a halogen atom such as palladium chloride,allyl palladium chloride, dichlorobis (acetonitrile)palladium anddichlorobis(benzonitrile)palladium, acetates such as palladium acetate;palladium complexes with β-diketone such as palladium-2,4-pentanedionate and palladium hexafluoropentane dionate; palladium complexeswith a compound having a conjugated carbonyl group such asbis(dibenzylideneacetone)palladium; phosphine-based palladium complexessuch as bis[1,2-bis(diphenylphosphino)ethane]palladium,bis(triphenylphosphine)palladium chloride,bis(triphenylphosphine)palladium acetate, diacetatebis(triphenylphosphine)palladium,dichloro[1,2-bis(diphenylphosphine)ethane]palladium,trans-dichlorobis(tricyclohexylphosphine)palladium,trans-dichlorobis(triphenylphosphine)palladium,trans-dichlorobis(tri-o-tolylphosphine)palladium andtetrakis(triphenylphosphine)palladium; aluminum alkoxides such asaluminum ethoxide, aluminum isopropoxide, aluminum-n-butoxide,aluminum-s-butoxide, aluminum-t-butoxide, aluminum ethoxyethoxyethoxide, aluminum phenoxide and aluminum lactate; aluminum alkylatessuch as aluminum acetate, aluminum acrylate, aluminum methacrylate andaluminum cyclohexane butyrate; and aluminum complexes with β-diketonesuch as aluminum-2,4-pentane dionate, aluminum hexafluoropentanedionate, aluminum-2,2,6,6-tetramethyl-3,5-heptane dionate,aluminum-s-butoxide bis(ethylacetoacetate), aluminum di-s-butoxide ethylacetoacetate and aluminum diisopropoxide ethyl acetoacetate.

Of these, titanium isopropoxide, aluminum isopropoxide, titaniumbis(ethylacetoacetate)diisopropoxide, titanium tetra(acetoacetate),palladium-2,4-pentane dionate, palladium hexafluoropentane dionate,aluminum-2,4-pentane dionate and aluminum hexafluoropentane dionate arepreferably used.

As a solvent used in the solution of the organometallic compoundcontaining a Ti, Pd or Al atom, any solvents which can dissolve, solelyor as a mixed solvent with water, the organometallic compound can beused. Illustrative examples of such solvents include water; ethers suchas tetrahydrofuran, dioxane, ethylene glycol dimethyl ether, ethyleneglycol diethyl ether, diethylene glycol dimethyl ether and diethyleneglycol diethyl ether; esters having an ether group such as ethyleneglycol monomethyl ether acetate, ethylene glycol monoethyl etheracetate, propylene glycol monomethyl ether acetate and propylene glycolmonoethyl ether acetate; hydrocarbons such as toluene, xylene, hexane,cyclohexane, octane, decalin, tetralin and durene; alcohols such asmethanol, ethanol and propanol; and aprotic polar solvents such asN-methylpyrrolidone, N,N-dimethyl formamide, N,N-dimethyl acetamide,hexamethyl phosphoamide and γ-butyrolactone. These solvents can be usedalone or as a mixed solvent with water.

The solution of the organometallic compound can be applied to thesubstrate by the same method as used to apply the solution of theconductive film forming composition. The thickness of the coating film(base layer) after removal of the solvent is preferably 0.001 to 10 μm,more preferably 0.005 to 1 μm. When the base layer is too thick, theflatness of the film is difficult to obtain, while when the base layeris too thin, the base layer may have poor adhesion to the substrate orthe film that it contacts. The base layer is formed by applying theabove solution and heating the applied solution so as to remove thesolvent. The heating temperature is 30 to 350° C., preferably 40 to 300°C.

The substrate used in the present invention may be a substrate having ahydrophobic portion and a hydrophilic portion on the same substrate.Thereby, a conductive film can be formed only in specific portions onthe substrate.

A portion corresponding to the hydrophobic portion on the substrate usedin the present invention which has the hydrophobic portion and ahydrophilic portion on the same substrate is formed by applying asolution containing, e.g., hexamethyldisilazane or the abovefluorine-based surfactant, only to the target portion and baking theapplied portion at 100 to 500° C. To apply the solution containinghexamethyldisilazane or the above fluorine-based surfactant only to thetarget portion, the whole surface of the substrate is made hydrophilicto be described later first, a necessary hydrophilic portion is covered,and the target hydrophobic portion is then made hydrophobic. A method ofcovering the hydrophilic portion is not particularly limited. Forexample, a method is used which comprises conducting patterning by aknown photolithography method to cover the portion which does notcorrespond to the hydrophobic portion with a known resist, or a methodis used which comprises using a masking tape to cover the portion whichdoes not correspond to the hydrophobic portion. Then, after forming aconductive film in the portion which corresponds to the hydrophobicportion, the used resist or masking tape is removed. Further, it is alsopossible that the whole surface of the substrate is made hydrophobicfirst and a specific portion is then made hydrophilic in a similarmanner.

Further, a portion corresponding to the hydrophilic portion on thesubstrate used in the present invention which has the hydrophobicportion and the hydrophilic portion on the same substrate can beobtained by applying a solution of a compound containing a Ti, Pd or Alatom to the portion corresponding to the hydrophilic portion on thesubstrate and drying the applied solution.

As the organometallic compound, the same compounds as the organiccompounds described above with respect to the base film can bepreferably used.

In the methods of the present invention, the coating film of thesolution of the conductive film forming composition is subjected to aheat treatment and/or a light treatment so as to be converted intowiring or an electrode which is a conductive film. The heat treatmenttemperature is preferably 60° C. or higher, more preferably 70 to 500°C. The heating time ranges from 30 seconds to about 120 minutes, forexample. Further, the atmosphere for the heat treatment is preferably aninert gas with minimum oxygen because a conductive film of good qualitycan be obtained. As the above inert gas, nitrogen, helium and argon canbe used, for example. Further, a mixed gas containing hydrogen may alsobe used as the inert gas. Further, the coating film of the solutionusing the conductive-film-forming composition may be treated with lightso as to form a conductive film. As a light source used for the lighttreatment, a low-pressure or high-pressure mercury lamp, a deuteriumlamp, discharge light of noble gas such as argon, krypton or xenon, aYAG laser, an argon laser, a carbon dioxide laser, and excimer lasers ofXeF, XeCl, XeBr, KrF, KrCl, ArF, ArCl and the like can be used. As theselight sources, those with an output of 10 to 5,000 W are preferablyused, but those with an output of 100 to 1,000 W are more preferablysufficient. The wavelengths of these light sources are not particularlylimited but are preferably 170 nm to 600 nm. Use of a laser beam isparticularly preferred from the viewpoint of an effect of modifying theconductive film. The temperature at the time of the light treatmentpreferably ranges from room temperature to 200° C. Further, to exposeonly a specific portion to light, the coating film may be exposed via amask.

A suitable thickness of the conductive film varies depending on thecoating method and the solid concentration. The thickness of the film ispreferably 0.01 to 100 μm, more preferably 0.05 to 10 μm. When the filmis too thick, the flatness of the film is difficult to attain, whilewhen the film is too thin, it may have poor adhesion to the substrate orthe film that it contacts.

The conductive film obtained as described above can be suitably used asan electrode for a solar cell, a semiconductor device and an electronicdevice such as an electronic display device.

Further, when the above conductive film is formed in the form of apattern, it can be used as wiring for the above electronic device.

A method of forming the conductive film in the form of a pattern is notparticularly limited. Illustrative examples of such a method include (1)a method comprising forming the conductive film as described above andthen removing unnecessary portions of the conductive film by etching soas to form a wiring pattern, (2) a method comprising applying a solutionof an organometallic compound only to a portion corresponding to awiring pattern on a substrate and then subjecting the coated portion toheating and/or a light treatment so as to form the wiring pattern, and(3) a method comprising applying a solution of an organometalliccompound on a substrate and then exposing only a portion correspondingto a wiring pattern to light so as to form the wiring pattern.

In the above method (1), there can be used a method comprising applyinga photoresist on the conductive film formed on the substrate,irradiating the photoresist with light via a photomask having a desiredpattern so as to develop it and then performing etching by use of analkaline aqueous solution.

As a coating method in the above method (2), an ink-jet method can beused, for example. The solution of the organometallic compound appliedin the form of a pattern can be subjected to heating and/or a lighttreatment in the same manner as in formation of the above conductivefilm so as to form the wiring pattern.

In the above method (3), light can be irradiated via a photomask havinga desired wiring pattern, for example. The light can be irradiated underthe same conditions as those for formation of the above conductive film.

When the thus obtained conductive film is left to stand in the air, itis oxidized easily, and an aluminum oxide layer is formed on thesurface. This may be a problem when the conductive film is used aswiring and/or an electrode. To prevent the oxidization, it is preferredto form a protective film solution in an inert gas atmosphere after theconductive film is formed in an inert gas atmosphere. As the protectivefilm, (i) a metal film selected from the group consisting of Ti, Pd andAl or (ii) an organic polymer film is preferably used, for example.

The above metal film can be formed by, e.g., applying a solution of thesame organometallic compound as the above organometallic compound forforming the base layer and then subjecting the applied solution toheating and/or exposure so as to convert the organometallic compound tocorresponding metal. The heating and/or exposure can be carried outunder the same conditions as those described above.

Meanwhile, the organic polymer film can be formed by applying a solutionof an organic polymer, scattering the solvent at a temperature of, e.g.,50 to 200° C. to be removed and drying the resulting film. The polymerused in the solution is not particularly limited. For example,homopolymers such as poly(meth)acrylates, e.g., a polymethylmethacrylate, a polybutyl methacrylate and a polyethyl acrylate, apolystyrene, a polybutene, a polyvinyl alcohol, a polyvinyl acetate anda polybutadiene or copolymers of these polymers can be used. As solventsused in these polymer solutions, any solvents which can dissolve thepolymers can be used.

The thickness of the protective film after removal of the solvent ispreferably 0.001 μm to 10 μm, more preferably 0.01 μm to 1 μm. When theprotective film is too thick, the flatness of the film is difficult toattain, while when it is too thin, it may have poor adhesion to thesubstrate or the film that it contacts.

EXAMPLES

Hereinafter, the present invention will be further described withreference to Examples. However, the present invention shall not belimited to these Examples in any way.

Example 1

100 g of 35% xylene solution of a complex of triethylamine synthesizedfrom triethylamine hydrochloride and lithium aluminum hydride and alanwas weighed into a 200-ml flask at room temperature in a nitrogenatmosphere. To the solution, 0.23 g of titaniumbis(ethylacetoacetate)diisopropoxide was added dropwise at roomtemperature. Then, the resulting solution was heated at 80° C. for 3minutes and then allowed to cool to room temperature, thereby preparinga composition comprising (1) the complex of the amine compound andhydrogenated aluminum, (2) the titanium-containing compound and (3) theorganic solvent. Then, a 10-cm square glass substrate was immersed in a10% toluene solution of titanium bis(ethylacetoacetate)diisopropoxidefor 1 hour and then dried at 100° C. for 30 minutes and 300° C. for 30minutes so as to prepare a hydrophilic substrate. The glass substratewas spin-coated with the composition comprising (1) the complex of theamine compound and hydrogenated aluminum, (2) the titanium-containingcompound and (3) the organic solvent at 1,000 rpm for 20 minutes in anitrogen atmosphere and then prebaked at 80° C. so as to remove thesolvent, thereby forming a film comprising (1) the complex oftriethylamine and alan and (2) the titanium-containing compound. Whenthe coating film was further heated at 200° C. for 30 minutes in anitrogen atmosphere so as to be thermally decomposed, a film havingmetallic luster was formed on the glass substrate. When the thickness ofthe film on the substrate was measured by use of α-step (product ofTenchor Co., Ltd.), it was found to be 175 nm. When ESCA of the film wasmeasured, a peak attributed to Al_(2p) aluminum was observed at 73.5 eV.Further, when the density of the film was measured by RutherfordBackscattering Spectroscopy (RBS), the density of 2.4 g/cm³ wasobtained. Further, when the conductivity of the film was examined, aspecific resistance of 17 μΩ·cm was obtained. Hence, it was found thatthe film could be suitably used as an electrode for an electronicdevice.

Example 2

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent was prepared in the same manner as in Example 1 exceptthat 0.24 g of titanium tetra(acetylacetate) was used in place of 0.23 gof titanium bis(ethylacetoacetate)diisopropoxide. 2 ml of the thusobtained coating solution was spin-coated and then baked in the samemanner as in Example 1 so as to form a 220-nm-thick film having aluminumluster on a 10-cm square glass substrate surface-treated with a 10%toluene solution of titanium bis(ethylacetoacetate)diisopropoxide. Whenthe density of the film was measured by RBS, the density of 2.3 g/cm³was obtained. Further, when the resistance of the film was measured, aspecific resistance of 23 μΩ·cm was obtained. Hence, it was found thatthe film could be suitably used as an electrode for an electronicdevice.

Example 3

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent was prepared in the same manner as in Example 1 exceptthat 0.13 g of dicyclopentadienyl titanium dichloride was used in placeof 0.23 g of titanium bis(ethylacetoacetate)diisopropoxide. 2 ml of thethus obtained coating solution was spin-coated and then baked in thesame manner as in Example 1 so as to form a 270-nm-thick film havingaluminum luster on a 10-cm square glass substrate surface-treated with a10% toluene solution of titanium bis(ethylacetoacetate)diisopropoxide.When the density of the film was measured by RBS, the density of 2.4g/cm³ was obtained. Further, when the resistance of the film wasmeasured, a specific resistance of 8 μΩ·cm was obtained. Hence, it wasfound that the film could be suitably used as an electrode for anelectronic device.

Example 4

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent was prepared in the same manner as in Example 1 exceptthat 0.066 g of dicyclopentadienyl titanium dichloride was used in placeof 0.23 g of titanium bis(ethylacetoacetate)diisopropoxide. 2 ml of thethus obtained coating solution was spin-coated and then baked in thesame manner as in Example 1 so as to form a 230-nm-thick film havingaluminum luster on a 10-cm square glass substrate surface-treated with a10% toluene solution of titanium bis (ethylacetoacetate) diisopropoxide.When the density of the film was measured by RBS, the density of 2.4g/cm³ was obtained. Further, when the resistance of the film wasmeasured, a specific resistance of 9 μΩ·cm was obtained. Hence, it wasfound that the film could be suitably used as an electrode for anelectronic device.

Example 5

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent was prepared in the same manner as in Example 1 exceptthat 0.12 g of cyclopentadienyl titanium trichloride was used in placeof 0.23 g of titanium bis(ethylacetoacetate)diisopropoxide. 2 ml of thethus obtained coating solution was spin-coated and then baked in thesame manner as in Example 1 so as to form a 210-nm-thick film havingaluminum luster on a 10-cm square glass substrate surface-treated with a10% toluene solution of titanium bis(ethylacetoacetate)diisopropoxide.When the density of the film was measured by RBS, the density of 2.4g/cm³ was obtained. Further, when the resistance of the film wasmeasured, a specific resistance of 11 μΩ·cm was obtained. Hence, it wasfound that the film could be suitably used as an electrode for anelectronic device.

Example 6

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent was prepared in the same manner as in Example 1 exceptthat 0.058 g of cyclopentadienyl titanium trichloride was used in placeof 0.23 g of titanium bis(ethylacetoacetate)diisopropoxide. 2 ml of thethus obtained coating solution was spin-coated and then baked in thesame manner as in Example 1 so as to form a 2.20-nm-thick film havingaluminum luster on a 10-cm square glass substrate surface-treated with a10% toluene solution of titanium bis (ethylacetoacetate)diisopropoxide.When the density of the film was measured by RBS, the density of 2.3g/cm³ was obtained. Further, when the resistance of the film wasmeasured, a specific resistance of 10 μΩ·cm was obtained. Hence, it wasfound that the film could be suitably used as an electrode for anelectronic device.

Comparative Example 1

Without using titanium bis(ethylacetoacetate)diisopropoxide used inExample 1, 2 ml of 35% solution of a complex of triethylaminesynthesized from triethylamine hydrochloride and lithium aluminumhydride and alan was spin-coated and then baked in the same manner as inExample 1 so as to form a 210-nm-thick film having aluminum luster on a10-cm glass substrate surface-treated with a 10% toluene solution oftitanium bis(ethylacetoacetate)diisopropoxide. When the resistance ofthe film was measured, a specific resistance of 65 μΩ·cm was obtained.Thus, it was found that a conductive film was obtained, but its specificresistance was relatively low. Further, when the density of the film wasmeasured by RBS, the density of 1.6 g/cm³ was obtained, indicating thatthe film density was also relatively low.

Example 7

100 g of 35% xylene solution of a complex of triethylamine synthesizedfrom triethylamine hydrochloride and lithium aluminum hydride and alanwas weighed into a 200-ml flask at room temperature in a nitrogenatmosphere. To the solution, 3.5 g of 70-nm diameter Ag particles ofULVAC INC. was added at room temperature and agitated for 30 minutes,thereby preparing a composition comprising (1) the complex of the aminecompound and hydrogenated aluminum, (2) the Ag particles and (3) theorganic solvent. Then, a 10-cm square glass substrate was immersed in a10% toluene solution of titanium bis(ethylacetoacetate)diisopropoxidefor 1 hour and then dried at 100° C. for 30 minutes and 300° C. for 30minutes so as to prepare a hydrophilic substrate. The glass substratewas spin-coated with the composition comprising (1) the complex of theamine compound and hydrogenated aluminum, (2) the Ag particles and (3)the organic solvent at 1,000 rpm for 20 minutes in a nitrogen atmosphereand then prebaked at 80° C. so as to remove the solvent, thereby forminga film comprising (1) the complex of triethylamine and alan and (2) theAg particles. When the coating film was further heated at 200° C. for 30minutes in a nitrogen atmosphere so as to be thermally decomposed, afilm having metallic luster was formed on the glass substrate. When thethickness of the film on the substrate was measured by use of α-step(product of Tenchor Co., Ltd.), it was found to be 800 nm. When ESCA ofthe film was measured, a peak attributed to Al_(2p) aluminum wasobserved at 73.5 eV. Further, when the light transmittance of the filmwas measured, a transmittance of 0% at a wavelength of 300 nm wasobtained, indicating that a dense aluminum film was obtained. Further,when the conductivity of the film was examined, a specific resistance of75 μΩ·cm was obtained. Hence, it was found that the film could besuitably used as an electrode for an electronic device.

Example 8

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) Cu particles and (3) an organic solvent wasprepared in the same manner as in Example 7 except that 3.5 g of Cuparticles with a particle diameter of 450 nm of Aldrich Co., Ltd. wereused in place of 3.5 g of Ag particles. 2 ml of the thus obtainedcoating solution was spin-coated and then baked in the same manner as inExample 7 so as to form a 750-nm-thick film having aluminum luster on a10-cm glass substrate treated with the same 10% toluene solution oftitanium bis(ethylacetoacetate)diisopropoxide as used in Example 7. Whenthe light transmittance of the film was measured, a transmittance of 0%at a wavelength of 300 nm was obtained, indicating that adense aluminumfilm was obtained. Further, when the resistance of the film wasmeasured, a specific resistance of 65 μΩ·cm was obtained. Hence, it wasfound that the film was suitable as an electrode for an electronicdevice.

Example 9

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) Ag particles and (3) an organic solvent wasprepared in the same manner as in Example 7 except that a 35% toluenesolution was used in place of the 35% xylene solution of the complex oftriethylamine synthesized from triethylamine hydrochloride and lithiumaluminum hydride and alan. 2 ml of the thus obtained coating solutionwas spin-coated on the same glass substrate as used in Example 7 at1,000 rpm for 20 seconds in a nitrogen atmosphere and then baked at 80Cfor 10 minutes and 200° C. for 30 minutes so as to obtain a 700-nm-thickfilm having aluminum luster. Further, when the light transmittance ofthe film was measured, a transmittance of 0% at a wavelength of 300 nmwas obtained, indicating that a dense aluminum film was obtained. Whenthe resistance of the film was measured, a specific resistance of 80μΩ·cm was obtained. Hence, it was found that the film was suitable as anelectrode for an electronic device.

Example 10

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) Cu particles and (3) an organic solvent wasprepared in the same manner as in Example 7 except that in place of the35% xylene solution of the complex of triethylamine synthesized fromtriethylamine hydrochloride and lithium aluminum hydride and alan, a 35%toluene solution of the complex was used. 2 ml of the thus obtainedcoating solution was spin-coated on the same glass substrate as used inExample 7 at 1,000 rpm for 20 seconds in a nitrogen atmosphere and thenbaked at 80° C. for 10 minutes and 200° C. for 30 minutes so as toobtain a 800-nm-thick film having aluminum luster. When the lighttransmittance of the film was measured, a transmittance of 0% at awavelength of 300 nm was obtained, indicating that a dense aluminum filmwas obtained. Further, when the resistance of the film was measured, aspecific resistance of 75 μΩ·cm was obtained. Hence, it was found thatthe film was suitable as an electrode for an electronic device.

Example 11

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) Ag particles and (3) an organic solvent wasprepared in the same manner as in Example 7 except that 2.5 g of Agarticles were used in place of 3.5 g of the 70-nm Ag particles of ULVACINC. 2 ml of the thus obtained coating solution was spin-coated on thesame glass substrate as used in Example 7 at 1,000 rpm for 20 seconds ina nitrogen atmosphere and then baked at 80° C. for 10 minutes and 200°C. for 30 minutes so as to obtain a 600-nm-thick film having aluminumluster. When the light transmittance of the film was measured, atransmittance of 0% at a wavelength of 300 nm was obtained, indicatingthat a dense aluminum film was obtained. Further, when the resistance ofthe film was measured, a specific resistance of 70 μΩ·cm was obtained.Hence, it was found that the film was suitable as an electrode for anelectronic device.

Example 12

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) Cu particles and (3) an organic solvent wasprepared in the same manner as in Example 8 except that 2.5 g of Cuarticles was used in place of 3.5 g of the Cu particles with a particlediameter of 450 nm of Aldrich Co., Ltd. 2 ml of the thus obtainedcoating solution was spin-coated on the same glass substrate as used inExample 8 at 1,000 rpm for 20 seconds in a nitrogen atmosphere and thenbaked at 80° C. for 10 minutes and 200° C. for 30 minutes so as toobtain a 800-nm-thick film having aluminum luster. Further, when thelight transmittance of the film was measured, a transmittance of 0% at awavelength of 300 nm was obtained, indicating that a dense aluminum filmwas obtained. Further, when the resistance of the film was measured, aspecific resistance of 80 μΩ·cm was obtained. Hence, it was found thatthe film could be suitably used as an electrode for an electronicdevice.

Comparative Example 2

Without using the Ag particles used in Example 7, 2 ml of 35% solutionof a complex of triethylamine synthesized from triethylaminehydrochloride and lithium aluminum hydride and alan was spin-coated andthen baked in the same manner as in Example 7 so as to form a240-nm-thick film having aluminum luster on a 5-cm square glasssubstrate on which a 20-nm titanium oxide film was formed by sputtering.When the resistance of the film was measured, a specific resistance of80 μΩ·cm was obtained, indicating that a conductive film was obtained.However, when the light transmittance of the film was measured, atransmittance of 8% at a wavelength of 300 nm was obtained, indicatingthat the density of the film was relatively low.

Example 13

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent and prepared in the same manner as in Example 1 wasspin-coated on a hydrophilic substrate obtained by immersing 10-cmsquare borosilicate glass in a 10% titaniumbis(ethylacetoacetate)diisopropoxide/toluene solution for 1 hour andthen drying the glass at 100° C. for 30 minutes and 300° C. for 30minutes. Then, the spin-coated substrate was prebaked at 80° C. so as toremove the solvent, whereby a film comprising (1) the complex oftriethylamine and alan and (2) the titanium-containing compound wasformed. As a result of further heating the coating film at 200° C. for30 minutes in a nitrogen atmosphere, a film having metallic luster wasformed. The thickness of the film on the substrate was 220 nm.

This film was coated with a photoresist for a G line (TFR9005D10G:product of JSR Corporation) by use of a spinner and then prebaked at 90°C. for 120 seconds so as to form a resist film. Then, the film wasexposed (to light of 436 nm for 400 msec) through a photomask having apattern having a width of 10 μm and a length of 5 cm by use of reducingprojection exposure equipment NSR1505G4D of Nikon Corporation, developedby a 2.38-wt % tetrammonium hydroxide aqueous solution, rinsed withultrapure water and then postbaked at 120° C. for 2 minutes so as toform a photoresist pattern on the conductive film.

Then, the resulting conductive film was immersed in a 0.1-N potassiumhydroxide solution for 10 minutes and rinsed with ultrapure water so asto be etched, and the resist was removed by use of oxygen plasma so asto form wiring having metallic luster and having a thickness of 200 nm,a line width of 10 μm and a length of 5 cm.

Electric resistance between both ends of the formed wiring was 10 mΩ.

Example 14

A composition comprising (1) a complex of an amine compound andhydrogenated aluminum, (2) a titanium-containing compound and (3) anorganic solvent and prepared in the same manner as in Example 1 waspattern-coated by an ink-jet method in the form of a straight linehaving a line width of 50 μm on a hydrophilic substrate obtained byimmersing 10-cm borosilicate glass in a 10% titaniumbis(ethylacetoacetate)diisopropoxide/toluene solution for 1 hour andthen drying the glass at 100° C. for 30 minutes and 300° C. for 30minutes. Then, the substrate was prebaked at 80° C. so as to remove thesolvent, whereby a film comprising (1) the complex of triethylamine andalan and (2) the titanium-containing compound was formed. As a result offurther heating the coating film at 200° C. for 30 minutes in a nitrogenatmosphere, wiring having metallic luster and having a thickness of 220nm, a line width of 50 μm and a length of 5 cm was formed. Electricresistance between both ends of the wiring was 2 mΩ.

As described in detail above, according to the present invention, thereis provided an industrial method of forming a film having conductivityeasily by forming a coating film by a solution coating method such as aspin coating method or an ink-jet method and then subjecting the coatingfilm to heat and/or light, unlike a conventional method of forming aconductive aluminum film by a vacuum process such as sputtering, vacuumdeposition or CVD. This method has an advantage that wiring and anelectrode which are uniform and dense films can be formed at low costs.

1. A composition for forming a conductive film comprising a complex ofan amine compound and a hydrogenated aluminum compound, and a titaniumcompound.
 2. The composition of claim 1, comprising the titaniumcompound in an amount of 0.001 to 30 mol % based on the total amount ofthe complex and the titanium compound. 3-13. (canceled)
 14. Wiringformed by a method comprising coating a substrate with a compositioncomprising (A) a complex of an amine compound and a hydrogenatedaluminum compound, and (B) a titanium compound and then subjecting theobtained coating film to heating and/or a light treatment to form aconductive film.
 15. An electrode formed by a method comprising coatinga substrate with a composition comprising (A) a complex of an aminecompound and a hydrogenated aluminum compound and (B) a titaniumcompound and then subjecting the obtained coating film to heating and/ora light treatment to form a conductive film.
 16. Wiring formed by amethod comprising coating a substrate with a composition comprising (A)a complex of an amine compound and a hydrogenated aluminum compound, and(C) metal particles and then subjecting the obtained coating film toheating and/or a light treatment to form a conductive film.
 17. Anelectrode formed by a method comprising coating a substrate with acomposition comprising (A) a complex of an amine compound and ahydrogenated aluminum compound, and (C) metal particles and thensubjecting the obtained coating film to heating and/or a light treatmentto form a conductive film.